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Tantalum sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚, 99.95% (metals basis 去除 Nb)
Tantalum sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚, 99.95% (metals basis 去除 Nb)
四硫代钼酸铵 (metals basis)(99.95%(trace metal basis))
Bromotris(triphenylphosphine)rhodium(I), 99.95% (metals basis), Rh 10.1% min三(三苯基膦)溴化铑(I), 99.95% (metals basis), Rh 10.1%ZD
Barium carbonate, 99.95% (metals basis)碳酸钡, 99.95% (metals basis)
锌线, 1.0mm (0.04in) 直径, 99.95% (metals basis)锌线, 1.0mm (0.04in) 直径, 99.95% (metals basis)管制类型：易制爆
Osmium powder, -20 mesh, 99.95% (metals basis)锇粉, -20目, 99.95% (metals basis)
Magnesium oxide, 99.95% (metals basis)氧化镁, 99.95% (metals basis)
Iridium black, 99.95% (metals basis)铱黑, 99.95% (metals basis)
Iridium powder, -60 mesh, 99.95% (metals basis)铱粉, -60 目, 99.95% (metals basis)
Iridium sponge, -100 mesh, 99.95% (metals basis)海绵状铱, -100 目, 99.95% (metals basis)
Iridium black, 99.95% (metals basis)Iridium black, 99.95% (metals basis)
Iridium shot, 6-7mm (0.24-0.28in), 99.95% (metals basis)铱粒, 6-7mm (0.24-0.28in), 99.95% (metals basis)
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