4. Ultra-High Efficiency Reflecting Grating 超GX反射光栅 LightSmyth’s ultra-high efficiency reflection gratings are designed for use in telecom polarizatire fabricated using projection lithography and reactive-ion-etch on a single-crystal-silicon substrate and metalized (gold for IR) to achieve very high efficiency for a single polarization. Each grating is a master, not a replica, resulting in low scattered light and long lasting performance. Wafer-scale cost-effective fabrication allows us to offer very competitive prices.
Advantages:Ultra-high efficiency for a single polarization
Robust dielectric materials, no polymers are used
Each grating is a master; ultra-low scatter
Highly competitive pricing; Telcordia-qualified
Applications:Optical telecommunications (laser sources, polarization diversity systems)
High power lasers
Tunable lasers
产品列表: Telecom Reflection Gratings |
P/N | Line Density (Lines/ mm) | Line Density Uniformity (Lines/mm) | Angle of Incidence (°) | Wavefront (@1545 nm λ2) | Thickness | Substrate Material |
SLG-C12 | 1200 | 0.001 | 68+1 | | 0.68+0.050 | Silicon |
STG-C12 | 1200 | | | <0.2 | 5.7+0.1 | Fused silica |
SLG-C11.7 | 1169.59 | 0.001 | 65+1 | | 0.68+0.050 | Silicon |
STG-C11.7 | 1169.59 | | | <0.2 | 5.7+0.1 | Fused silica |
Notes: | 1 P-polarization: E vector is perpendicular to the grating line |
| 2 Over 25×12 mm aperture |
| 3 Better tolerances and surface quality available for custom products |
| The following parameters apply to SLG-12 and SLG-11.7 products: – Wavelength Range (in vacuum) = 1525-1565 nm – Operational Polarization1 = P- – Diffraction Efficiency = >90% – Coating = Gold – Technology = lithographic patterning, reactive ion etch – Width and Height Tolerance3 = +0.2 mm – Grating clear aperture (CA) = Centered, 0.5 mm from substrate edges – Surface quality in CA = 60/40 scratch/dig |
5. Standard Reflection Gratings 标准反射光栅Reflection gratings are used in a variety of optical applications requiring spatial separation of light by wavelength. LightSmyth’s ultra-low
scatter reflection gratings are fabricated using projection lithography and reactive-ion-etch of single-crystal-silicon substrates. Gratings may
be coated by a variety of metallic and dielectric materials and optimized for your application using our highly accurate coating simulation
software and state-of-the-art coating facility. Each grating is a master, not a replica, resulting in low-scatter and long lasting performance.
LightSmyth reflection gratings reduce scattered light up to 100X compared to conventional commercial replicated holographic gratings and mechanically ruled gratings.
Advantages:Each grating is a high-performance master, no polymers used
Very low cost (lower than prices of replicated gratings)
Free of replication/ruling flaws; ultra-low scatter
Robust single crystal silicon substrate
Copper-like thermal conductivity
Bests Pyrex glass in minimizing thermal expansion
Applications:Remote Optical Sensors and Spectroscopy
High power lasers
Spectral beam combining
Astronomy and Space exploration
产品列表: Part Number2 | Line Density (Lines/mm) | Groove depth (nm) | Size (mm)1, 6 |
SLG-C72-1212A-Al | 7200 | 50 | 12.5 × 12.5 |
SLG-C72-252-Al | 7200 | 50 | 25 x 25 |
Part Number2 | Line Density (Lines/mm) | λPE (nm)3, 4, 5 | Size (mm)1, 6 |
SLG-C36-1212A-Al | 3600 | 240nm(s); 480nm(p) | 12.5 × 12.5 |
SLG-C24-252-Al | 2400 | 300nm(s); 540nm(p) | 12.5 × 12.5 |
SLG-C18-2009A-Al | 1800 | 390nm(s); 660nm up to 1µm(p) | 20 x 9 |
SLG-C17.4-2209-Al | 1740 | TBD | 22.1 x 9.1 |
SLG-C16.5-2912-Al | 1650 | TBD | 29.1 x 12.1 |
SLG-C14.8-2410-Al | 1480 | TBD | 24.1 x 10.1 |
SLG-C12-1212A-Al | 1200 | 580nm(s); 1µm, 1.55µm(p) | 12.5 x 12.5 |
SLG-C12-252-Al | 1200 | 580nm(s); 1µm, 1.55µm(p) | 25 x 25 |
Notes: | 1 Second dimension corresponds to the groove length |
| 2 The standard reflective coating is Aluminum. Aluminum + MgF2 protective layer, Aluminum + Al2O3 protective layer, and gold coatings are available as an option |
| 3 The peak efficiency wavelength, λPE, indicates wavelength(s) of highest efficiency for a given polarization state (in parenthesis) |
| 4 P-polarization: Incident electric field vector is perpendicular to grating lines. S-polarization: incident electric field vector is perpendicular to grating lines |
| 5 Values are given for Littrow mount. |
| 6 Typical grating thickness is approximately 0.7 mm. Substrate height and width tolerance is +0.3 mm. Grating composition: single crystal silicon, reactive ion etch, reflective metal coating. |