粉末与颗粒原子层沉积系统 ALD
美国ALD NANOSOLUTIONS公司技术,专注于粉末颗粒表面镀膜。
专用于在粉末、颗粒表面沉积ALD薄膜,可用于科研,生产。单批次体积从45ml~150L,满足科研到生产的需要。可沉积氧化物,氮化物,金属等类型薄膜。可用于锂离子电池、催化剂等需要粉末镀膜的行业。
专业的粉末镀膜原子层沉积系统,为科研与生产提供专业的解决方案。
设备沉积方法有:流化床法、滚动法、振动法。
粉末原子层沉积系统型号:
FX系列:75 or 150 mL,适用于R&D
FP系列: 500 mL / 2 L / 5 L / 10 L,适用于R&D,生产
RX系列:10 or 40 mL, 适用于R&D
RP系列: ~40L, 适用于生产
CVR系列:15L/hr to 150L/hr,适用于生产
![](http://item.yiqi.com/pic/ConPic/5/fx.jpg)
![](http://item.yiqi.com/pic/ConPic/5/ALDN-FP-Reactor-Tool.jpg)
![](http://item.yiqi.com/pic/ConPic/5/ALDN-RX-with-Glove-Box-Option-300x270.jpg)
粉末原子层沉积系统技术参数:
ALD REACTOR SYSTEMS
|
Fluidized
Bed Reactors
(FBR)
|
Rotary Reactors (Rotary)
|
Continuous Vibrating Reactors (CVR)
|
Substrate Volume
|
75mL to 10L per batch
|
10ml to 40L
|
15L/hr to 150L/hr
|
Substrate Mass
(Density Dependent)
|
75g - 12.5kg per batch
|
10g - 50kg per batch
|
15kg/hr to 150kg/hr
|
Vapor Draw Sources
|
2 standard,
up to 8
|
2 standard,
up to 8
|
2 standard,
up to 8
|
Regulatory Compliance
|
CE, GMP and ISO compliance upon request
|
Weight
|
300 lbs -
1,000 lbs (150kg - 500kg)
|
300lbs - 4,000lb (150kg
- 2000kg)
|
500lbs - 8,000lb (250kg - 4000kg)
|
Venting Emissions and Abatement
|
Equipment can be designed to comply with local jurisdiction codes and regulations
|
Electrical Requirements
|
Project-specific and customized. Further details can be supplied upon request
|
Demonstrated Particle Diameters
|
10 nm - 500micron
|
10 nm - 200micron
|
5-50micron
|
Potential Particle Diameters
|
2 nm - 1mm
|
2 nm - 250px
|
10nm - 1 cm
|
Other Features
|
Highest Precursor Efficiency
|
Plasma ALD Compatible
|
Atmospheric Pressure Operation
|
Fluidization Reactor – Experimental Series (FX)
Reactor Style:
|
Fluidization Reactor
|
Substrate Volume:
|
75 or 150 mL
|
Reactor Temperatures Range:
|
25 – 450 °C
|
Maximum Process Line Temperatures:
|
200 °C
|
Vapor Draw Sources:
|
2 standard, up to 4
|
Dosing Valves:
|
Heated Metal Diaphragm
|
Vacuum Pump:
|
Rotary Vane (9 CFM or greater)
|
Regulatory Compliance:
|
CE Marked
|
Weight:
|
300 lbs/ 140 kg
|
Options Available:
|
Substrate Loading
Low Vapor Pressure Containers capable of 150 °C
Residual Gas Analyzer
Waste Abatement
Glovebox
Research License for ALD on Particles
Various Vapor Sources
|
Fluidization Reactor – Pilot Series (FP)
Reactor Style:
|
Fluidization Reactor
|
Substrate Volume:
|
500 mL / 2 L / 5 L / 10 L
|
Reactor Temperatures Range:
|
25 – 450 °C
|
Maximum Process Line Temperatures:
|
200 °C
|
Vapor Draw Sources:
|
2 standard, up to 8
|
Dosing Valves:
|
Heated Metal Diaphragm
|
Vacuum Pump:
|
Rotary Vane (9 CFM or greater)
|
Regulatory Compliance:
|
CE Marked
|
Weight:
|
400 lbs/ 180 kg
|
Options Available:
|
Substrate Loading
Low Vapor Pressure Containers capable of 150 °C
Residual Gas Analyzer
Waste Abatement
Research License for ALD on Particles
Various Vapor Sources
|
Rotary ALD Reactor – Pilot Series (RP)
Reactor Style:
|
Rotary Reactor
|
Substrate Volume:
|
~40 L
|
Reactor Temperatures Range:
|
25 – 200 °C
|
Maximum Process Line Temperatures:
|
200 °C
|
Vapor Draw Sources:
|
2 standard, up to 8
|
Dosing Valves:
|
Heated Metal Diaphragm
|
Vacuum Pump:
|
Rotary Vane (9 CFM or greater)
|
Regulatory Compliance:
|
CE Marked
|
Weight:
|
500 lbs/ 230 kg
|
Options Available:
|
Substrate Loading
Low Vapor Pressure Containers capable of 150 °C
Residual Gas Analyzer
Waste Abatement
Integrated Glovebox
Research License for ALD on Particles
Various Vapor Sources
|
Rotary ALD Reactor – Experimental Series (RX)
Reactor Style:
|
Rotary Reactor
|
Substrate Volume:
|
10 or 40 mL
|
Reactor Temperatures Range:
|
25 – 200 °C
|
Maximum Process Line Temperatures:
|
200 °C
|
Vapor Draw Sources:
|
2 standard, up to 8
|
Dosing Valves:
|
Heated Metal Diaphragm
|
Vacuum Pump:
|
Rotary Vane (9 CFM or greater)
|
Regulatory Compliance:
|
CE Marked
|
Weight:
|
300 lbs/ 140 kg
|
Options Available:
|
Substrate Loading
Plasma Source from Meaglow
Low Vapor Pressure Containers capable of 150 °C
Residual Gas Analyzer
Waste Abatement
Integrated Glovebox
Research License for ALD on Particles
Various Vapor Sources
|