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CAS:Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca),41072-each
CAS:Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ca),41072-each
Tantalum sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚, 99.95% (metals basis 去除 Nb)
Tantalum sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚, 99.95% (metals basis 去除 Nb)
Tantalum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚, 99.95% (metals basis 去除 Nb)
Tantalum sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Nb)钽溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚, 99.95% (metals basis 去除 Nb)
Niobium sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ta)铌溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚, 99.95% (metals basis 去除 Ta)
Niobium sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis excluding Ta)铌溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚, 99.95% (metals basis 去除 Ta)
Niobium sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis excluding Ta)铌溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚, 99.95% (metals basis 去除 Ta)
Magnesium fluoride pieces, 3-6 mm, 99.9% trace metals basis (excluding Na)
Magnesium fluoride, 99% (metals basis excluding Ca & Na), Ca+Na <1%氟化镁, 99% (metals basis 去除Ca和Na), Ca+Na <1%
Magnesium fluoride, 99.9% (metals basis excluding Ca & Na), Ca+Na <1%氟化镁, 99.9% (metals basis去除 Ca和Na), Ca+Na <1%
Zirconium boride, 99.5% (metals basis excluding Hf)硼化锆, 99.5% (metals basis excluding Hf)
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