德国海德堡 Heidelberg 激光直写光刻机

DWL 66+激光光刻系统是具经济效益的高分辨率图像产生器，适用于小批量掩模板制作和直写需求。该系统的功能和灵活性使其成为Life Science, Advanced Packaging, MEMS, Micro-Optics, Semiconductor以及所有其他需要微结构应用的刻研工具。DWL 66+的客户群包括200多所ZD大学和研究机构，许多系统功能是与这些机构合作开发，及先进技术不断改进以增加高分办率：DWL 66+的Z小结构尺寸为300 nm，提供了极高的分辨率，优于或等于研发领域中大的光学光刻系统。

基本的DWL 66+包含创造和分析微结构所需的所有功能。它可以用于掩模板制作或直写在任何涂有光刻胶的平坦材料上，多样化选择可提高灵活性，使系统适用于更多应用领域。

技术参数

DWL 66+ laser lithography system is a cost-effective high resolution image generator suitable for small batch mask making ａnd direct writing requirements.The functionality ａnd flexibility of the system make it a lithography tool for Life Science, Advanced Packaging, MEMS, micro-optics, Semiconductor ａnd all other applications that require microstructure.DWL 66 + customer base includes more than 200 world top universities ａnd research institutes, many of the system function is to work with these institutions development, ａnd advanced technology continuously improve in order to increase the rate of high office: the smallest structure size of the DWL 66 + is 300 nm, provides high resolution, is better than or equal to the research ａnd development in the field of the most powerful optical lithography system.

The basic DWL 66+ contains all the functionality needed to create ａnd analyze microstructures.It can be used to make a mask or write directly on any flat material coated with photoresist, ａnd a variety of options can increase flexibility ａnd make the system suitable for a wider range of applications.